Microlithography Science and Technology 2nd Edition by Kazuaki Suzuki,Bruce Smith 9780824790240 0824790243

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ISBN 10:0824790243 
ISBN 13:9780824790240
Author:Kazuaki Suzuki,Bruce Smith

This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world’s leading academic and industrial laboratories detailed by a stellar panel of international experts.

New in the Second EditionIn addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including:

• Immersion Lithography
• 157nm Lithography
• Electron Projection Lithography (EPL)
• Extreme Ultraviolet (EUV) Lithography
• Imprint Lithography
• Photoresists for 193nm and Immersion Lithography
• Scatterometry

Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition.

Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.

Microlithography Science and Technology 2nd  Table of contents:

Part I: Exposure System

chapter 1
System Overview of Optical Steppers and Scanners
chapter 2
Optical Lithography Modeling
chapter 3
Optics for Photolithography
chapter 4
Excimer Laser for Advanced Microlithography
chapter 5
Alignment and Overlay
chapter 6
Electron Beam Lithography Systems
chapter 7
X-ray Lithography
chapter 8
EUV Lithography
chapter 9
Imprint Lithography 
Part II: Resists and Processing

chapter 10
Chemistry of Photoresist Materials
chapter 11
Resist Processing
chapter 12
Multilayer Resist Technology
chapter 13
Dry Etching of Photoresists
Part III: Metrology and Nanolithography

chapter 14
Critical-Dimensional Metrology for Integrated-Circuit Technology
chapter 15
Electron Beam Nanolithography

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Kazuaki Suzuki,Bruce Smith,Technology,Science,Microlithography