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Capacitive Silicon Resonators Performance Enhancement Methods 1st Edition by Nguyen Van Toan, Takahito Ono ISBN 0429560990 9780429565465

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Capacitive Silicon Resonators Performance Enhancement Methods 1st Edition Nguyen Van Toan (Author) Digital Instant Download

Author(s): Nguyen Van Toan (Author); Takahito Ono (Author)
ISBN(s): 9780429565465, 0429560990
Edition: 1
File Details: PDF, 26.69 MB
Year: 2019
Language: english
SKU: EB-12052798 Category: Tags: ,

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ISBN 10: 0429560990
ISBN 13: 9780429565465
Author: Nguyen Van Toan, Takahito Ono

Microfabricated resonators play an essential role in a variety of applications, including mass sensing, timing reference applications, and filtering applications. Many transduction mechanisms including piezoelectric, piezoresistive, and capacitive mechanisms, have been studied to induce and detect the motion of resonators. This book is meant to introduce and suggest several technological approaches together with design considerations for performance enhancement of capacitive silicon resonators, and will be useful for those working in field of micro and nanotechnology. Features Introduces and suggests several technological approaches together with design considerations for performance enhancement of capacitive silicon resonators Provides information on the various fabrication technologies and design considerations that can be employed to improve the performance capacitive silicon resonator which is one of the promising options to replace the quartz crystal resonator. Discusses several technological approaches including hermetic packaging based on the LTCC substrate, deep reactive ion etching, neutral beam etching technology, and metal-assisted chemical etching, as well as design considerations for mechanically coupled, selective vibration of high-order mode, movable electrode structures, and piezoresistive heat engines were investigated to achieve small motional resistance, low insertion loss, and high quality factor. Focusses on a capacitive sensing method based on the measurement of the change in capacitance between a sensing electrode and the resonant body. Reviews recent progress in performance enhancement methods for capacitive silicon resonator, which are mainly based on the works of the authors.

Capacitive Silicon Resonators Performance Enhancement Methods 1st Table of contents:

Chapter 1 Introduction
1.1 Introduction
1.2 Review of Microfabricated Resonators
1.3 Structure of the Book
References
Part 1 Backgrounds
Chapter 2 Capacitive Silicon Resonator Structures
2.1 Device Structure and Working Principle
2.2 Equivalent Circuit Model
2.3 Finite Element Model
2.4 Key Parameters of Capacitive Silicon Resonators
2.4.1 Resonant Frequency
2.4.2 Quality Factor
2.4.3 Motional Resistance
2.4.4 Feed-Through Capacitance
2.4.5 Tuning Frequency
References
Chapter 3 Fabrication Techniques for Capacitive Silicon Resonators
3.1 Cleaning Process
3.2 Deposition Techniques
3.2.1 Silicon Dioxide
3.2.1.1 Thermal Oxidation Method
3.2.1.2 Plasma-Enhanced Chemical Vapor Deposition
3.2.2 Metal Deposition
3.2.2.1 Electron Beam Evaporation
3.2.2.2 Sputtering
3.3 Lithography
3.3.1 Photolithography
3.3.2 Electron Beam Lithography
3.4 Etching Techniques
3.4.1 Silicon Dioxide and Glass
3.4.1.1 Sandblasting
3.4.1.2 Wet Etching
3.4.1.3 Fast Atom Beam Technology
3.4.1.4 Reactive Ion Etching
3.4.2 Silicon
3.5 Anodic Bonding Process
3.6 Supercritical Drying
References
Part 2A Performance Enhancement Methods for Capacitive Silicon Resonators
Chapter 4 Hermetically Packaged Capacitive Silicon Resonators on LTCC Substrate
4.1 Introduction
4.2 LTCC Substrate
4.3 Device Fabrication
4.4 Measurement Setup
4.5 Measurement Results
4.6 Summary
References
Chapter 5 A Long-Bar-Type Capacitive Silicon Resonator with a High Quality Factor
5.1 Introduction
5.2 Device Structure and Fabricated Results
5.3 Parasitic Capacitance Cancellation
5.3.1 Measurement Results
5.4 Summary
References
Chapter 6 Capacitive Silicon Resonators Using Neutral Beam Etching Technology
6.1 Introduction
6.2 Neutral Beam Etching Technology
6.2.1 Sample Preparation
6.2.2 Neutral Beam Etching Apparatus
6.2.3 NBE Results and Discussion
6.3 Experimental Methodology
6.4 Evaluation Results
6.5 Summary
References
Chapter 7 Capacitive Silicon Resonators with Narrow Gaps Formed by Metal-Assisted Chemical Etching
7.1 Introduction
7.2 Metal-Assisted Chemical Etching
7.2.1 Theory of Metal-Assisted Chemical Etching
7.2.2 Survey of Metal-Assisted Chemical Etching
7.2.2.1 Effect of Etching Time
7.2.2.2 Effect of Pattern Size
7.2.2.3 Effect of Concentration of Etching Solution
7.2.2.4 High-Aspect-Ratio Silicon Structures
7.3 Capacitive Silicon Resonator
7.4 Summary
References
Part 2B Performance Enhancement Methods for Capacitive Silicon Resonators
Chapter 8 Mechanically Coupled Capacitive Nanomechanical Silicon Resonators
8.1 Introduction
8.2 Device Structure and Working Principle
8.3 Experiments
8.3.1 Device Fabrication
8.3.2 Measurement Results
8.4 Summary
References
Chapter 9 Capacitive Silicon Nanomechanical Resonators with Selective Vibration of High-Order Mode
9.1 Introduction
9.2 Device Description
9.3 Experiments
9.3.1 Experimental Methodology
9.3.2 Measurement Setup
9.3.3 Measurement Results
9.4 Summary
References
Chapter 10 Capacitive Silicon Resonators with Movable Electrode Structures
10.1 Introduction
10.2 Fundamentals of Electrostatic Parallel Plate Actuation
10.3 Design, Modeling, and Simulation
10.3.1 Resonator Structure
10.3.2 Working Principle
10.3.3 Design of Movable Electrode Structures
10.4 Fabricated Results
10.5 Measurement Results
10.6 Summary
References
Chapter 11 Capacitive Silicon Resonators with Piezoresistive Heat Engines
11.1 Introduction
11.2 Device Description
11.2.1 Device Structure and Working Principle
11.2.2 Finite Element Method (FEM) Simulation
11.3 Experiments and Discussions
11.3.1 Fabrication
11.3.2 Measurement Setup
11.3.3 Measurement Results
11.4 Summary

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Tags: Nguyen Van Toan, Takahito Ono, Capacitive Silicon, Enhancement Methods